China Materials Conference 2024 and the Second World Materials Conference
2025-01-21
On July 9, 2024, the China Materials Conference 2024 and the Second World Materials Conference, hosted by the Chinese Materials Research Society, co-hosted by the European Materials Research Society, and co-organized by Guangdong University of Technology, grandly opened at the Guangzhou Baiyun International Conference Center. This conference is an academic exchange event in the field of new materials, interdisciplinary, cross-field, and cross-industry, held against the backdrop of accelerating high-level technological self-reliance and strength. It is a new brand conference in the Chinese new materials community with high academic standards, wide-ranging fields, and cutting-edge dynamics. Nearly a hundred academicians and over 25,000 materials science and technology workers attended the conference.
On July 10, during the conference report sessions (II) and (III), seven outstanding experts and scholars presented a series of wonderful academic reports to the attendees present and those watching the live broadcast through various channels. Here we present the highlights of the conference reports for the readers.
Yuzo Shigesato, Professor at Aoyama Gakuin University, President of the Japan Materials Research Society
Report Title: "Various functional oxide films with high performances deposited by reactive sputtering"
Using alloy target materials for reactive sputtering to deposit oxide or nitride films is an effective way to achieve high deposition rates in industrial applications. Compared to oxide surfaces, metal surfaces have a higher sputtering yield, and due to their higher thermal conductivity, they can apply higher sputtering power densities, making this technology attractive for various applications. However, the reactive sputtering process is very sensitive to the oxygen flow ratio, leading to a lag in deposition rates concerning oxygen flow. This behavior stems from the oxidation state of the target surface, where the deposition rate significantly decreases with increasing oxygen flow. To address this challenge and ensure the acquisition of high-quality transparent conductive oxide (TCO) films that have both high deposition rates and reproducibility, precise control of sputtering conditions is crucial.
To this end, a specially designed feedback system combining discharge impedance or plasma emission intensity has been adopted, along with medium-frequency pulsed technology. These systems can precisely control the deposition process, ensuring the acquisition of high-quality films with the desired performance. The report delves into the detailed process of achieving ultra-high deposition rates of various TCOs (including aluminum-doped zinc oxide (AZO), tin-doped indium oxide (ITO), niobium-doped titanium dioxide (NTO), or antimony (tantalum) doped tin oxide (ATO, TTO) films) through reactive sputtering using Zn-Al, In-Sn, Ti-Nb, or Sn-Sb (Ta) alloy target materials. Additionally, the deposition of titanium dioxide (TiO2) or tungsten trioxide (WO3) photocatalysts and various optical films is introduced, showcasing the multifunctionality and potential of reactive sputtering in various applications. The latest research on thermal switch devices prepared using Y-Mg, Ni-Mg, and Gd films through hydrogenation/dehydrogenation reactions is also presented.
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